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High Purity 5N Silica Silicon Dioxide SiO2 manufacture

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Title: High Purity 5N Silica Silicon Dioxide SiO2 manufacture 
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NAME:Silicon dioxide
Chemical formula:SiO2
Molecular weight:60.084
CAS14808-60-7
Density (indoor temperature):2.2 g/cm3
Melting point:1650(±50)℃
Boiling point:2230℃
Solubility:0.012g/100ml(In water)

Silica is used for manufacturing flat glass, glass products, foundry sand, glass fiber, ceramic glaze, rust sandblasting, sand filter, flux, refractory material and manufacturing lightweight foam concrete. The use of silica is very wide. In nature, the more scarce of the crystal can be used to manufacture the electronic industry's important components, optical instruments and crafts. Silica is an important raw material for making optical fiber. Generally more pure quartz, can be used to manufacture the quartz glass. Quartz glass expansion coefficient is very small, equivalent to ordinary glass 1/18, can withstand the drastic changes in temperature, good acid resistance (except HF), therefore, quartz glass used to manufacture high temperature chemical instrument. Quartz sand used for glass and building materials. Silicon dioxide is an important component of glass, quartz glass, water glass, optical fiber, electronic industry, optical instruments, handicrafts and refractory materials, is an important material for scientific research. Rubber synthetic materials, synthetic resin filler, ink (ink jet printer), paint thickening agent, extinction agent, feed additive, quartz glass, making glass adhesive. Granularity range: customizable 0.1-5mm


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